Plasma Etching: Fundamentals and Applications - Series on Semiconductor Science and Technology - Sugawara, M. (Professor, Professor, Hachinohe Institute of Technology, Japan) - Bøker - Oxford University Press - 9780198562870 - 28. mai 1998
Ved uoverensstemmelse mellom cover og tittel gjelder tittel

Sugawara, M. (Professor, Professor, Hachinohe Institute of Technology, Japan)

Plasma Etching: Fundamentals and Applications - Series on Semiconductor Science and Technology

Pris
NOK 2.899

Bestillingsvarer

Forventes levert 3. - 12. des
Julegaver kan byttes frem til 31. januar
Legg til iMusic ønskeliste
eller

The focus of this book is the remarkable advances in understanding of low pressure RF (radio frequency) glow discharges. A basic analytical theory and plasma physics are explained. Plasma diagnostics are also covered before the practicalities of etcher use are explored.


356 pages, 2 colour plates, 5 halftones, numerous line figures

Media Bøker     Innbunden bok   (Bok med hard rygg og stivt omslag)
Utgitt 28. mai 1998
ISBN13 9780198562870
Utgivere Oxford University Press
Antall sider 356
Mål 163 × 242 × 23 mm   ·   743 g
Språk Engelsk