Hf-Based High-k Dielectrics: Process Development, Performance Characterization, and Reliability - Synthesis Lectures on Solid State Materials and Devices - Young-Hee Kim - Bøker - Springer International Publishing AG - 9783031014246 - 31. desember 2007
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Young-Hee Kim
Hf-Based High-k Dielectrics: Process Development, Performance Characterization, and Reliability - Synthesis Lectures on Solid State Materials and Devices

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Hard breakdown and soft breakdown, particularly the Weibull slopes, were studied under constant voltage stress. The origin of soft breakdown (first breakdown) was studied and the results suggested that the soft breakdown may be due to one layer breakdown in the bilayer structure (HfO2/SiO2: 4 nm/4 nm).

92 pages, X, 92 p.

Media Bøker     Pocketbok   (Bok med mykt omslag og limt rygg)
Utgitt 31. desember 2007
ISBN13 9783031014246
Utgivere Springer International Publishing AG
Antall sider 92
Mål 150 × 220 × 10 mm   ·   212 g
Språk Engelsk  

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