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Feature Profile Evolution in Plasma Processing Using On-wafer Monitoring System - SpringerBriefs in Applied Sciences and Technology 2014 edition
Seiji Samukawa
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Feature Profile Evolution in Plasma Processing Using On-wafer Monitoring System - SpringerBriefs in Applied Sciences and Technology 2014 edition
Seiji Samukawa
Three types of sensors are introduced: on-wafer UV sensors, on-wafer charge-up sensors and on-wafer sheath-shape sensors in the plasma processing and prediction system of real etching profiles based on monitoring data.
40 pages, 30 Illustrations, color; 5 Illustrations, black and white; VIII, 40 p. 35 illus., 30 illus
| Media | Bøker Pocketbok (Bok med mykt omslag og limt rygg) |
| Utgitt | 17. februar 2014 |
| ISBN13 | 9784431547945 |
| Utgivere | Springer Verlag, Japan |
| Antall sider | 40 |
| Mål | 155 × 235 × 222 mm · 86 g |
| Språk | Engelsk |
Se alt med Seiji Samukawa ( f.eks. Pocketbok )