Fortell venner om denne varen:
Machine Learning-Based Modelling in Atomic Layer Deposition Processes - Emerging Materials and Technologies Oluwatobi Adeleke
Pris
NOK 2.389
Bestillingsvarer
Forventes levert 3. - 17. jun
Legg til iMusic ønskeliste
eller
Finnes også som:
Machine Learning-Based Modelling in Atomic Layer Deposition Processes - Emerging Materials and Technologies
Oluwatobi Adeleke
This book describes the application of machine learning modelling approaches in atomic layer deposition and presents detailed information on modelling, optimization, and prediction of the behaviour and characteristics of ALD for improved process quality control.
496 pages, 102 Line drawings, black and white; 24 Halftones, black and white; 126 Illustrations, bla
| Media | Bøker Innbunden bok (Bok med hard rygg og stivt omslag) |
| Utgitt | 15. desember 2023 |
| ISBN13 | 9781032386706 |
| Utgivere | Taylor & Francis Ltd |
| Antall sider | 354 |
| Mål | 150 × 220 × 20 mm · 662 g |
| Språk | Engelsk |