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Optical and EUV Lithography: A Modeling Perspective - Press Monographs Andreas Erdmann
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Optical and EUV Lithography: A Modeling Perspective - Press Monographs
Andreas Erdmann
Introduces interested students with backgrounds in physics, optics, computational engineering, mathematics, chemistry, material science, nanotechnology, and other areas to the fascinating field of lithographic techniques for nanofabrication. It should also help senior engineers and managers expand their knowledge of alternative methods and applications.
374 pages
| Media | Bøker Pocketbok (Bok med mykt omslag og limt rygg) |
| Utgitt | 30. april 2021 |
| ISBN13 | 9781510639010 |
| Utgivere | SPIE Press |
| Antall sider | 374 |
| Mål | 255 × 178 × 24 mm · 682 g |
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